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Papua New Guinea Chrome tube target Cr
Category:
Papua New GuineaChrome pipe
Product Description
The chromium tube target can be processed into a hot isostatic pressing (HIP) integral forming chromium tube target and a sprayed chromium tube target. Compared with the two chromium tube targets, the hot isostatic pressing integral forming chromium tube target has the advantages of low oxygen content, high density, uniform density and good quality of coating, etc.
Compared with the spraying chromium tube target, the integral forming chromium tube target by HIP has the advantages of low oxygen content, high density, uniform and compact coating and so on.
| Performance Product performance |
Spraying Chrome Tube Target Spraying chromium tube target |
Hot Isostatic Pressing Integral Forming Chrome Tube Target Integral forming chromium tube target by HIP |
| Oxygen content/ppm Oxygen content |
≤ 5000 |
80-1500 |
| coating uniformity Deposition uniformity |
1. The axial density of the whole tube is quite different. 2. The difference between L, A and B values in the upper, middle and lower of the whole furnace is large 3. Can not guarantee the consistency of the product film 1.The density of the tube target along the axial is different. 2.The value of L, A and B is different in the whole furnace. 3.The consistency of the product film can not be guaranteed |
1. High uniformity of the whole tube 2. The density is close to the pure metal hot extrusion density, the pipe body density is consistent 3. No loose area, no dark area 4.PVD film thickness and color consistency is good 5. The unity of L, A and B values in the upper, middle and lower of the whole furnace is good. 1.High uniformity of the whole tube 2.The density of the whole tube target is close to hot extrusion density and is consistent 3.No loose area and dark area 4.The consistency of the thickness and color of the PVD film is good 4.The values of L, A and B in the whole furnace are good. 5.The value of L, A and B is consistent in the whole furnace. |
| coating current density Deposition current density |
Unable to achieve high current long time operation Can not work for a long time at large current |
High power and long time stable work Can steadily work for a long time under high power |
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