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U.S.A Silicon aluminum target material SiAl

The silicon aluminum target material produced by the company adopts advanced hot isostatic pressing process and thermal spraying process. The products include rectangular target, circular arc target and tube target, which have the advantages of wide composition ratio range (aluminum content is 10at%~ 90at%), high purity and density, fine grain uniformity and long service life.

Category:

U.S.ASilicon aluminum target material SiAl

Product Description

The silicon aluminum target material produced by the company adopts advanced hot isostatic pressing process and thermal spraying process. The products include rectangular target, circular arc target and tube target, which have the advantages of wide composition ratio range (aluminum content is 10at%~ 90at%), high purity and density, fine grain uniformity and long service life. The typical composition ratio of silicon aluminum target material is 90:10wt%, 70:30wt%, etc., and the special composition and specification target material can also be customized according to customer requirements.

 

Our silicon-aluminum target including rectangular target, arc target and tube target is manufactured by hot isostatic pressing and thermal spraying technology and has the advantages of wide range of component (The content of aluminum is 10% ~ 90at%), high purity and density, fine and uniform grain size and long service life. The typical component of silicon-aluminum target is 90:10wt%, 70:30wt% and so on. The silicon-aluminum target of special component and specification can also be customized according to the customer's requirements. 

 

silicon aluminum target
Silicon-aluminum target

Performance
Product performance

Chemical composition/at%
Composition

   Si90Al10

Si70Al30

Purity/%
Purity

99.8

99.8

Density/g/cm3
Density

≥ 2.31

≥ 2.41

Grain size/μm
Grain size

≤100

≤100

Total metal impurities/ppm
Total content of metallic impurities

≤ 2000

≤ 2000

Size/mm
Size

planar target
Planar target

hot isostatic pressing
Hot isostatic pressing
≤ 1000 × 250

hot isostatic pressing
Hot isostatic pressing
≤ 1000 × 250

rotating target
Rotating target

thermal spray forming
thermal spraying
Length ≤ 4000
Thickness Thickness ≤ 15


thermal spray forming
thermal spraying
Length ≤ 4000
Thickness Thickness ≤ 15


 

SiAl (90:10 wt%)

Ingredients (elements)

Silicon (Si)

Aluminum (Al)

Iron (Fe)

Copper (Cu)

Manganese (Mn)

Carbon (C)

Calcium (Ca)

Oxygen (O)

Nitrogen (N)

Test values (wt%)

90.19

9.66

≤ 0.074

0.002

0.002

0.04

0.002

≤ 0.04

0.04

Density (g/cm3)(Density)

2.36

 

SiAl (70:30 wt%)

Ingredients (elements)

Silicon (Si)

Aluminum (Al)

Iron (Fe)

Copper (Cu)

Manganese (Mn)

Carbon (C)

Calcium (Ca)

Oxygen (O)

Nitrogen (N)

Test values (wt%)

70.81

28.93

≤ 0.071

0.002

0.002

0.04

0.002

≤0.05

0.04

Density (g/cm3)(Density)

2.42