Electron beam evaporation method is a kind of vacuum evaporation coating, which is a method of directly heating the evaporation material by electron beam under vacuum condition, so that the evaporation material is transported to the substrate and condensed into a thin film on the substrate. In the electron beam heating device, the heated material is placed in the crucible tongs of cold water, which can avoid the evaporation material from reacting with the crucible wall to affect the quality of the film. Therefore, the electron beam evaporation deposition can prepare a high-purity film, and at the same time, a plurality of crucibles can be placed in the same evaporation deposition device to realize simultaneous or separate evaporation and deposition of a variety of different substances. By electron beam evaporation, any material can be evaporated, and different materials require different types of crucibles to achieve the desired evaporation rate. elemental evaporation material high purity metal evaporation material name molecular formula purity name molecular formula purity high purity chromium Cr3N-5N high purity manganese Mn3N-5N high purity aluminum Al3N-5N high purity tungsten W3N-5N high purity nickel Ni3N-5N high purity silicon Si3N-5N high purity copper Cu3N-5N high purity niobium Nb3N-5N high purity titanium Ti3N-5N