溅射靶材主要应用于电子及信息产业，如集成电路、信息存储、液晶显示屏、激光存储器、电子控制器件等；亦可应用于玻璃镀膜领域；还可以应用于耐磨材料、高温耐蚀、高档装饰用品等行业。其中靶材就是做芯片的重要材料。最知名的就是国外芯片——英伟达，一直属于行业龙头老大。但是随着中国的实力日渐强度，我们的华为已经自主的研发生产出与之抗衡的电子芯片。彻底打破了一直采用国外技术的这一现象。

　　像超大规模集成电路芯片制造领域是溅射靶材最高端的应用，其对溅射靶材金属纯度的要求最高，通常要求达到99.9995%(5N5)以上，平板显示器、太阳能电池用铝靶的金属纯度略低，分别要求达到99.999%(5N)、99.995%(4N5)以上达到99.999(而一般金属也就99.8的纯度)。

Sputtering targets are mainly used in electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memories, electronic control devices, etc.; they can also be used in the field of glass coating; they can also be applied to wear-resistant materials, high temperature corrosion resistance. , high-end decorative supplies and other industries. Among them, the target is an important material for making chips. The most well-known is the foreign chip - Nvidia, has always been the industry leader. However, with the increasing strength of China, our Huawei has independently developed and produced electronic chips that compete with it. This phenomenon has been completely broken by the use of foreign technology.

For example, the field of ultra-large-scale integrated circuit chip manufacturing is the highest-end application of sputtering targets, which has the highest requirements on the purity of sputtering target metals, usually required to reach 99.9995% (5N5) or more, and the metal purity of flat-panel displays and aluminum targets for solar cells. Slightly lower, it is required to reach 99.999% (5N) and 99.995% (4N5) respectively. Up to 99.999 (and the general metal is also 99.8 purity).