真空蒸发膜是在真空度不低于10-2Pa的环境中,用电阻加热或电子束和激光轰击等方法把要蒸发的材料加热到定温度,使材料中分子或原子的热振动能量超过表面的束缚能,从而使大量分子或原子蒸发或升华,并直接沉淀在基片上形成薄膜。离子泥射镀膜是利用气体放电产生的正离子在电场的作用下的高谏运动轰击作为阴极的靶,使靶材中的原子或分子逸出来而沉淀到被镀工件的表面,形成所需要的薄膜。

　　真空蒸发镀膜最常用的是电胆加热法,其优点是加热源的结构简单,造价低廉,操作方便缺点是不适用于难焰金属和耐高温的介质材料。电子束加热和激光加热则能克服电阻加热的缺点。电子束加热上利用聚焦电子束直接对被轰击材料加热,电子束的动能变成热能,使材料蒸发。激光加热是利用大功率的激光作为加热源,但由于大功率激光器的造价很高,目前只能在少数研究性实验室中使用。

The vacuum evaporation film heats the material to be evaporated to a constant temperature by means of resistance heating or electron beam and laser bombardment in an environment with a vacuum of not less than 10-2 Pa, so that the thermal vibration energy of the molecules or atoms in the material exceeds the surface. The binding energy enables a large number of molecules or atoms to evaporate or sublimate and precipitate directly on the substrate to form a film. The ionic mud coating is a target of a cathode that utilizes a high-energy motion of a positive ion generated by a gas discharge under the action of an electric field to cause atoms or molecules in the target to escape and precipitate on the surface of the workpiece to be formed. film.

The most commonly used vacuum evaporation coating is the electric heating method. The advantage of the heating source is that the structure of the heating source is simple, the cost is low, and the operation is convenient. The disadvantage is that it is not suitable for the flame-resistant metal and the high-temperature resistant dielectric material. Electron beam heating and laser heating can overcome the shortcomings of resistance heating. Electron beam heating uses a focused electron beam to directly heat the bombarded material, and the kinetic energy of the electron beam becomes thermal energy, causing the material to evaporate. Laser heating uses a high-power laser as a heating source, but due to the high cost of high-power lasers, it can only be used in a few research laboratories.