Beijing Kunxingyuan Technology Co., Ltd

  • Home

  • About

  • News

  • Products

  • Cooperative Enterprise

  • Message

  • Contact

  • Shopping cart

中

溅射靶材

新闻资讯

News Center

Company News

Industry Information

Technical knowledge

  • Home page

磁控溅射沉积设备原理Principle of magnetron sputtering deposition equipment


Release time:

2018-12-27 10:46



Previous Page

热等静压工艺简介HIP Technology Profile

北京坤星元科技有限公司网站上线Beijing Kunxingyuan Technology Co., Ltd. website online

Next Page

Previous Page

热等静压工艺简介HIP Technology Profile

Next Page

北京坤星元科技有限公司网站上线Beijing Kunxingyuan Technology Co., Ltd. website online

Evaporation coating materials: the key to improving product quality

2023-10-14


High-Purity Metal Powders: The Future of Innovative Materials Manufacturing

2023-10-04


Multi-material high-purity PVD sputtering target material: in what areas?

2023-09-24


High Purity Chromium Targets: Understanding the Manufacturing Process of High PVD Sputtering Targets

2023-09-14


Picture Name

Company address: No.16, East Road, Xiong Erzhai Township, Pinggu District, Beijing

Picture Name

Contact Phone:+86-131-4682-7737  

+86-153-3336-1951

Picture Name

E-mail:Kunxingyuan@126.com  

zym@bjkxykj.cn  zxy@bjkxykj.cn


Page Copyright Beijing Kunxingyuan Technology Co., Ltd.

Website Construction: China Enterprise Power Jinzhou SEO

Business License